Lithographic method and apparatus
US10948832B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 6, 2018 |
| Grant date | Mar 16, 2021 |
| Priority date | — |
| Expiry date | Mar 6, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70891
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second component, wherein the first component of the aberration signal comprises a first frequency band and the second component of the aberration signal comprises a second frequency band, wherein the first frequency band comprises frequencies that are higher than frequencies comprised in the second frequency band, calculating a correction, wherein a first part of the correction is calculated based on the first component of the aberration signal, and applying the correction to the lithographic apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.