Method of imprinting tilt angle light gratings
US10955606B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 14, 2018 |
| Grant date | Mar 23, 2021 |
| Priority date | — |
| Expiry date | Oct 1, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2027/0125
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments described herein relate to methods of fabricating waveguide structures with gratings having front angles less than about 45° and back angles less than about 45°. The methods include imprinting stamps into nanoimprint resists disposed on substrates. The nanoimprint resists are subjected to a cure process. The stamps are released from the nanoimprint resist at a release angle ϑ using a release method. The nanoimprint resists are subjected to an anneal process to form a waveguide structure comprising a plurality of gratings with a front angle α and a back angle β relative to a second plane of the surface of the substrate less than about 45°.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.