Pellicle frame and pellicle
US10955740B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 30, 2017 |
| Grant date | Mar 23, 2021 |
| Priority date | — |
| Expiry date | Apr 8, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC22F1/00
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The present invention provides; a pellicle frame which can effectively inhibit distortion of the photo mask (8) caused by mounting the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided, and a manufacturing method of a blackened pellicle frame is also provided which can reduce the defect of the surface flickering under concentrated light and which facilitates inspection of the foreign matter adhesion prior to use. The present invention relates to a pellicle frame with an anodized film on a surface of an aluminum alloy frame, characterized in that: the aluminum alloy frame comprises an aluminum alloy which contains Ca: 5.0 to 10.0% by mass with the remainder aluminum and unavoidable impurities are contained, and has an area (volume) ratio of an Al4Ca phase, which is a dispersed phase, is greater than or equal to 25%, and a crystal structure of a part of the Al4Ca phase is monoclinic; wherein the Al4Ca phase dispersed in the anodized film is anodized, and the anodized film is stained with a black dye.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.