Daiki Taneichi
14Patents
2h-index
21Co-inventors
50Inventor score
Filing activity: Oct 27, 2004 → Sep 3, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9841670B2 | Support frame for pellicles | Physics | 5 | Active |
| US8945799B2 | Pellicle and mask adhesive agent for use in same | Chemistry; Metallurgy | 3 | Active |
| US7291672B2 | Paste composition and uses thereof | Chemistry; Metallurgy | 2 | Expired |
| US7977429B2 | Polymers and uses thereof | Chemistry; Metallurgy | 2 | Active |
| US10216081B2 | Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device | Electricity | 2 | Active |
| US10585348B2 | Pellicle, pellicle production method and exposure method using pellicle | Physics | 1 | Active |
| US12344773B2 | Mask adhesive and pellicle comprising same | Emerging Cross-Sectional Technologies | 0 | Active |
| US11852968B2 | Pellicle, exposure master, exposure device and method for manufacturing semiconductor device | Physics | 0 | Active |
| US10488751B2 | Pellicle, production method thereof, exposure method | Electricity | 0 | Active |
| US10955740B2 | Pellicle frame and pellicle | Chemistry; Metallurgy | 0 | Active |
| US10606169B2 | Pellicle frame, pellicle containing same, method for producing pellicle frame, and method for producing pellicle | Chemistry; Metallurgy | 0 | Active |
| US10895805B2 | Pellicle manufacturing method and method for manufacturing photomask with pellicle | Physics | 0 | Active |
| US10185217B2 | Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device | General | 0 | Revoked |
| US11137677B2 | Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing method | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.