Patent · US Active

Electron source and production method therefor

US10957511B2 · kind B2 · utility

0Cited by
3References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 9, 2019
Grant dateMar 23, 2021
Priority date
Expiry dateDec 9, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/06341
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

An electron source capable of suppressing consumption of an electron emission material is provide. The present invention provides an electron source including: an electron emission material; and, an electron emission-suppressing material covering a side surface of the electron emission material, wherein a work function of the electron emission-suppressing material is higher than that of the electron emission material, and a thermal emissivity of the electron emission-suppressing material is lower than that of the electron emission material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.