Patent · US Active

Flaw detecting apparatus, method for detecting flaw of plane mirror based on line scanning and ring band stitching

US10962487B2 · kind B2 · utility

0Cited by
1References
8Claims
0Family size

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Key dates

Filing dateNov 12, 2019
Grant dateMar 30, 2021
Priority date
Expiry dateNov 12, 2039

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B26/105
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A flaw detecting apparatus and a method for a plane mirror based on line scanning and ring band stitching are provided. The flaw detecting apparatus comprises: a line scanning detector, an annular illumination source, a rotary table rotatable about a Z axis, a translation table translatable along an X axis and a processor. By translating and rotating the plane mirror to be detected, an entire surface of the plane mirror to be detected can be detected by the line scanning detector, and the flaw of the entire plane mirror to be detected is obtained by a ring band stitching method. The method of line scanning and ring band stitching reduces the imaging distortion, the intermediate data amount, the difficulty in the distortion correction and difficulty in stitching, and improves the detection speed and the detection quality.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.