Institute of Optics and Electronics, Chinese Academy of Sciences
45Patents
45Active
45Granted
60Portfolio score
Filing activity: Sep 7, 2007 → Oct 15, 2024 · 5 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7679750B2 | Cavity ring-down apparatus and method for measuring reflectivity of highly reflective mirrors | Physics | 21 | Active |
| US8020992B2 | Human eye adaptive optical visual perception training method and apparatus thereof | Human Necessities | 8 | Active |
| US8020991B2 | Two-eye adaptive optical visual perception training method and apparatus thereof | Human Necessities | 7 | Active |
| US9693829B2 | Microscopic surgery system and navigation method guided by optical coherence tomography (OCT) and automated OCT imaging field calibration | Human Necessities | 6 | Active |
| US9236943B2 | Method of eliminating offset in spot centroid due to crosstalk | Physics | 3 | Active |
| US9958784B2 | Super-resolution imaging photolithography | Physics | 2 | Active |
| US9400220B2 | Method for detecting focus plane based on Hartmann wavefront detection principle | Physics | 2 | Active |
| US8189958B2 | Method of fast image reconstruction | Physics | 1 | Active |
| US8764241B2 | Ring light source system for interferometer with adjustable ring radius and ring radial width | Physics | 1 | Active |
| US12315117B2 | Illumination field non-uniformity detection system, detection method, correction method, and device | Physics | 0 | Active |
| US8061841B2 | Customizing equipment for individualized contact lenses | Physics | 0 | Active |
| US11693320B2 | Secondary imaging optical lithography method and apparatus | Physics | 0 | Active |
| US10976670B2 | Apparatus and method for detecting optimal focal plane of lithographic projection objective lens | Physics | 0 | Active |
| US11175472B2 | Three-dimensional dynamic adjustment and locking mechanism | Physics | 0 | Active |
| US11724962B2 | Method for etching curved substrate | Electricity | 0 | Active |
| US11714358B2 | Intelligent correction device control system for super-resolution lithography precision mask | Electricity | 0 | Active |
| US9537280B2 | Dual beamsplitting element based excimer laser pulse stretching device | Electricity | 0 | Active |
| US12228710B1 | Ultra-wide angle broadband polarization imaging system based on metasurface, and detection apparatus | Physics | 0 | Active |
| US11163237B2 | Method for figure correction of optical element by reactive ion etching | Performing Operations; Transporting | 0 | Active |
| US8842292B2 | Apparatus and method for detecting optical profile | Physics | 0 | Active |
| US9610022B1 | Adaptive optical objective inspection instrument for optic nerve function | Human Necessities | 0 | Active |
| US11754352B2 | Visible light-transparent and radiative-cooling multilayer film | Performing Operations; Transporting | 0 | Active |
| US11268808B2 | Detection device for detecting lens surface in stitching interferometer | Physics | 0 | Active |
| US11365964B2 | Stitching-measurement device and stitching-measurement method | Physics | 0 | Active |
| US12085846B2 | Method for inverse optical proximity correction of super-resolution lithography based on level set algorithm | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.