Composition for semiconductor process and semiconductor process
US10968390B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | Mar 5, 2019 |
| Grant date | Apr 6, 2021 |
| Priority date | — |
| Expiry date | Mar 5, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K13/00
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Provided are a composition for a semiconductor process, which comprises a first component comprising an inorganic acid or an organic acid; and a second component comprising a silicon compound represented by Formula 1, and a semiconductor process, which comprises selectively cleaning and/or removing an organic substance or an inorganic substance using the composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.