Patent · US Active

Photoresist composition

US10969685B2 · kind B2 · utility

0Cited by
4References
3Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 19, 2014
Grant dateApr 6, 2021
Priority date—
Expiry dateSep 19, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/0392
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A photoresist composition comprising:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.