Patent · US Active

Plasma cell for providing VUV filtering in a laser-sustained plasma light source

US10976025B2 · kind B2 · utility

0Cited by

13References

8Claims

0Family size

Assignee

KLA Corporation · US

Inventors

Ilya Bezel · Mountain View, US
Anatoly Shchemelinin · Pleasanton, US
Eugene Shifrin · Sunnyvale, US
Matthew Panzer · San Jose, US
Matthew Derstine · Sunnyvale, US
Jincheng Wang · Nanhu, CN
Anant Chimmalgi · San Jose, US
Rajeev Patil · Fremont, US
Rudolf Brunner · Baldham, DE

Key dates

Filing date	Feb 13, 2018
Grant date	Apr 13, 2021
Priority date	—
Expiry date	Aug 5, 2038

Classification

Technology area (CPC H)Electricity
CPC primaryH01J65/04
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A plasma cell for use in a laser-sustained plasma light source includes a plasma bulb configured to contain a gas suitable for generating a plasma. The plasma bulb is transparent to light from a pump laser, wherein the plasma bulb is transparent to at least a portion of a collectable spectral region of illumination emitted by the plasma. The plasma bulb of the plasma cell is configured to filter short wavelength radiation, such as VUV radiation, emitted by the plasma sustained within the bulb in order to keep the short wavelength radiation from impinging on the interior surface of the bulb.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.