Polymer containing silphenylene and polyether structures
US10982053B2 · kind B2 · utility
5Cited by
12References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 16, 2019 |
| Grant date | Apr 20, 2021 |
| Priority date | — |
| Expiry date | Jun 24, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2201/0162
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A novel polymer containing silphenylene and polyether structures in the backbone is used to formulate a photosensitive composition having improved reliability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.