Hideto Kato
101Patents
12h-index
59Co-inventors
89Inventor score
Filing activity: May 13, 1986 → May 16, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7785766B2 | Silphenylene-bearing polymer, photo-curable resin composition, patterning process, and substrate circuit protective film | Emerging Cross-Sectional Technologies | 22 | Active |
| US5590855A | Train detection device for railroad models and train crossing control apparatus utilizing the train detection device | Emerging Cross-Sectional Technologies | 21 | Expired |
| US6590010B2 | Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective coating | Emerging Cross-Sectional Technologies | 20 | Expired |
| US7041766B2 | Colorless and transparent polyimidesilicone resin having thermosetting functional groups | Electricity | 18 | Expired |
| US6210855A | Positive resist composition suitable for lift-off technique and pattern forming method | Physics | 17 | Expired |
| US8715905B2 | Silphenylene-containing photocurable composition, pattern formation method using same, and optical semiconductor element obtained using the method | Emerging Cross-Sectional Technologies | 17 | Active |
| US7214743B2 | Resist lower layer film material and method for forming a pattern | Physics | 16 | Expired |
| US7476485B2 | Resist lower layer film material and method for forming a pattern | Physics | 16 | Expired |
| US6001534A | Photosensitive resin composition | Physics | 15 | Expired |
| US6456198B1 | Fence sensor | Physics | 15 | Expired |
| US6143423A | Flame retardant epoxy resin compositions | Emerging Cross-Sectional Technologies | 13 | Expired |
| US6440646B1 | Positive resist composition suitable for lift-off technique and pattern forming method | Physics | 12 | Expired |
| US4742177A | Methacrylic acid ester | Chemistry; Metallurgy | 11 | Expired |
| US6383944B1 | Micropatterning method | Electricity | 11 | Expired |
| US6635400B2 | Resist composition and patterning process | Physics | 11 | Expired |
| US7485405B2 | Photo-curable resin composition comprising a polyimide, a process for forming a pattern therewith, and a substrate protecting film | Emerging Cross-Sectional Technologies | 11 | Active |
| US5441845A | Photosensitive resin composition comprising a polyimide precursor and a photosensitive diazoquinone | Physics | 10 | Expired |
| US5616448A | Photosensitive resin composition and a process for forming a patterned polyimide film using the same | Physics | 10 | Expired |
| US5041513A | Polyimide resin compositions | Electricity | 9 | Expired |
| US5587275A | Photosensitive resin composition and a process for forming a patterned polyimide film using the same | Electricity | 9 | Expired |
| US4652663A | Novel organosilicon compound | Chemistry; Metallurgy | 8 | Expired |
| US5714572A | Polyimide resin composition | Emerging Cross-Sectional Technologies | 8 | Expired |
| US5346979A | Curable resin, process for making and electronic part protective coating | Chemistry; Metallurgy | 8 | Expired |
| US7060761B2 | Epoxy resin compositions | Chemistry; Metallurgy | 8 | Expired |
| US5376733A | Precursor composition capable of yielding a polyimidesilicone resin | Chemistry; Metallurgy | 8 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.