Patent · US Active

Control device for actuating an actuator unit of a lithography system, lithography system having a control device, and method for operating the control device

US10983443B2 · kind B2 · utility

1Cited by

2References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Stefan Krone · Aalen, DE
Lars Berger · Heubach, DE
Ralf Kiesel · Aalen, DE
Paul Wijlaars · Someren, NL

Key dates

Filing date	Jun 20, 2019
Grant date	Apr 20, 2021
Priority date	—
Expiry date	Aug 1, 2039

Classification

Technology area (CPC H)Electricity
CPC primaryH10N30/802
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A control device actuates actuator unit to set a position of an optical element of a lithography system. The control device includes an amplifier unit for providing a control signal for the actuator unit via a voltage signal and a PWM signal. The PWM signal has a duty factor and a clock frequency. The control device also includes a modulator unit designed to provide the PWM signal having the duty factor and a defined clock frequency from a plurality of defined clock frequencies. A defined clock frequency of the plurality of defined clock frequencies is an integer multiple of a basic clock frequency. The basic clock frequency is in the range of 10 kHz to 1 MHz.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.