Stochastic reticle defect dispositioning
US10990019B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 19, 2020 |
| Grant date | Apr 27, 2021 |
| Priority date | — |
| Expiry date | Mar 19, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7065
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for stochastic reticle defect dispositioning is disclosed. The system includes a controller including one or more processors and memory. The one or more processors configured to acquire product metrology data of a product reticle. The one or more processors configured to perform one or more stochastic simulations based on the product metrology data to generate one or more simulated product samples including the pattern of elements. The one or more processors configured to generate a product model of the product reticle modeling the printing process of the pattern of elements by the product reticle. The one or more processors configured to identify at least one of a care area of the product reticle which is susceptible to printing stochastic defects on product samples, or a care area on the one or more simulated product samples which is susceptible to printed stochastic defects based on the product model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.