Inventor · Sunnyvale, CA, US

Moshe E. Preil

28Patents
13h-index
41Co-inventors
77Inventor score

Filing activity: Feb 11, 2003 → Mar 19, 2020

Most-cited inventions

PatentTitleAreaCited byStatus
US7769225B2 Methods and systems for detecting defects in a reticle design pattern Physics 62 Active
US7646906B2 Computer-implemented methods for detecting defects in reticle design data Physics 61 Active
US7853920B2 Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturing Physics 49 Active
US7689966B2 Methods, systems, and carrier media for evaluating reticle layout data Physics 46 Expired
US7695876B2 Method for identifying and using process window signature patterns for lithography process control Physics 42 Active
US7804994B2 Overlay metrology and control method Physics 37 Active
US7749666B2 System and method for measuring and analyzing lithographic parameters and determining optimal process corrections Physics 31 Active
US8057967B2 Process window signature patterns for lithography process control Physics 27 Active
US7557921B1 Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools Physics 27 Active
US8200002B2 Photo-mask and wafer image reconstruction Physics 16 Active
US8208712B2 Photo-mask and wafer image reconstruction Physics 15 Active
US8204295B2 Photo-mask and wafer image reconstruction Physics 15 Active
US8790522B1 Chemical and physical templates for forming patterns using directed self-assembly materials Electricity 14 Active
US8331645B2 Photo-mask and wafer image reconstruction Physics 13 Active
US8260032B2 Photo-mask and wafer image reconstruction Physics 12 Active
US8280146B2 Photo-mask and wafer image reconstruction Physics 11 Active
US8956808B2 Asymmetric templates for forming non-periodic patterns using directed self-assembly materials Physics 7 Active
US8318391B2 Process window signature patterns for lithography process control Physics 6 Active
US6868301B1 Method and application of metrology and process diagnostic information for improved overlay control Physics 6 Expired
US8644588B2 Photo-mask and wafer image reconstruction Physics 5 Active
US9188974B1 Methods for improved monitor and control of lithography processes Physics 5 Active
US8889343B2 Optimizing lithographic processes using laser annealing techniques Physics 5 Active
US10474042B2 Stochastically-aware metrology and fabrication Physics 4 Active
US10990019B2 Stochastic reticle defect dispositioning Physics 4 Active
US9508562B2 Sidewall image templates for directed self-assembly materials Electricity 2 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.