Apparatus and method for treating substrate
US10991603B2 · kind B2 · utility
1Cited by
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15Claims
0Family size
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Key dates
| Filing date | Aug 29, 2019 |
| Grant date | Apr 27, 2021 |
| Priority date | — |
| Expiry date | Aug 29, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6715
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for treating a substrate includes a mixing step of preparing an ozone treatment fluid containing an ozone gas and a substrate treating step of treating a surface of the substrate using the ozone treatment fluid. In the substrate treating step, light is irradiated to the substrate by a lamp.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.