Substrate holding/rotating device, substrate processing apparatus including the same, and substrate processing method
US10998220B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2018 |
| Grant date | May 4, 2021 |
| Priority date | — |
| Expiry date | Feb 22, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68785
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The substrate holding/rotating device includes a plurality of movable pins each having a support portion in contact with a peripheral edge portion of the substrate to support the substrate, and a rotation unit which rotates the plurality of movable pins around the rotation axis, a support portion of each of the movable pins included in a first pin group is disposed so as to move between a first hold position included hold positions, the first hold position close to a rotation axis and a second hold position included the hold positions, the second hold position far apart from the first hold position to one in a circumferential direction and also so as to move between the first and second hold positions and an open position far apart from the rotation axis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.