Patent · US Active

Method and device for the correction of imaging defects

US11003088B2 · kind B2 · utility

5Cited by

9References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Franz Sorg · Aalen, DE
Peter Deufel · Oberkochen, DE
Toralf Gruner · Hennef (Sieg), DE

Key dates

Filing date	Apr 6, 2020
Grant date	May 11, 2021
Priority date	—
Expiry date	Apr 6, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70933
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.