Toralf Gruner
128Patents
10h-index
168Co-inventors
83Inventor score
Filing activity: Aug 21, 2001 → Apr 5, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7408616B2 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Physics | 76 | Expired |
| US7145720B2 | Objective with fluoride crystal lenses | Emerging Cross-Sectional Technologies | 62 | Expired |
| US7460206B2 | Projection objective for immersion lithography | Physics | 53 | Expired |
| US7847921B2 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Physics | 47 | Active |
| US7256932B2 | Optical system for ultraviolet light | Physics | 36 | Expired |
| US6728043B2 | Microlithographic illumination method and a projection lens for carrying out the method | Emerging Cross-Sectional Technologies | 23 | Expired |
| US6806942B2 | Projection exposure system | Physics | 22 | Expired |
| US7463422B2 | Projection exposure apparatus | Physics | 16 | Active |
| US7239450B2 | Method of determining lens materials for a projection exposure apparatus | Physics | 16 | Expired |
| US8325322B2 | Optical correction device | Physics | 11 | Active |
| US8237918B2 | Optical system of a microlithographic projection exposure apparatus | Physics | 10 | Active |
| US8379188B2 | Optical system | Physics | 10 | Active |
| US7286284B2 | Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection | Emerging Cross-Sectional Technologies | 9 | Expired |
| US8508854B2 | Optical element and method | Physics | 6 | Active |
| US8310752B2 | Method of manufacturing a projection objective and projection objective | Physics | 6 | Active |
| US7589903B2 | Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method | Physics | 5 | Active |
| US6963449B2 | Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7027237B2 | Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method | Emerging Cross-Sectional Technologies | 5 | Expired |
| US11003088B2 | Method and device for the correction of imaging defects | Physics | 5 | Active |
| US8896814B2 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Physics | 5 | Active |
| US7782440B2 | Projection lens system of a microlithographic projection exposure installation | Physics | 4 | Active |
| US7982854B2 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system | Physics | 4 | Active |
| US10120176B2 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Physics | 3 | Active |
| US9146475B2 | Projection exposure system and projection exposure method | Physics | 3 | Active |
| US7423765B2 | Optical system of a microlithographic projection exposure apparatus | Physics | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.