Method and apparatus for dynamic lithographic exposure
US11003089B2 · kind B2 · utility
0Cited by
9References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 16, 2020 |
| Grant date | May 11, 2021 |
| Priority date | — |
| Expiry date | Apr 16, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure, in some embodiments, relates to a method of performing a photolithography process. The method includes forming a photosensitive material over a substantially flat upper surface of a substrate. The substantially flat upper surface of the substrate extends between opposing sides of the substrate. The photosensitive material is exposed to electromagnetic radiation at a plurality of depths of focus that are centered at different heights over the substrate. The photosensitive material is developed to remove a part of the photosensitive material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.