Lithography apparatus comprising a plurality of individually controllable write heads

US11003090B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Stefan Richter · Seattle, US
• Enrico Geissler · Jena, DE
• Dirk Doering · Erfurt, DE
• Lakshmanan Senthil Kumar · Erfurt, DE
• Guenter Rudolph · Jena, DE
• Martin Voelcker · Oberkochen, DE
• Markus Deguenther · Aalen, DE

Key dates

• Filing date: Jan 31, 2020
• Grant date: May 11, 2021
• Expiry date: Jan 31, 2040

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/7085
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.