Markus Deguenther
110Patents
9h-index
99Co-inventors
79Inventor score
Filing activity: Dec 17, 2004 → Jun 11, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7511886B2 | Optical beam transformation system and illumination system comprising an optical beam transformation system | Physics | 56 | Expired |
| US8259393B2 | Polarization-modulating optical element | Physics | 41 | Active |
| US8279524B2 | Polarization-modulating optical element | Physics | 39 | Expired |
| US8270077B2 | Polarization-modulating optical element | Physics | 29 | Expired |
| US8320043B2 | Illumination apparatus for microlithographyprojection system including polarization-modulating optical element | Physics | 29 | Active |
| US8289623B2 | Polarization-modulating optical element | Physics | 29 | Active |
| US7605386B2 | Optical device with raster elements, and illumination system with the optical device | Physics | 18 | Active |
| US9013684B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 15 | Active |
| US9599904B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 14 | Active |
| US8482717B2 | Polarization-modulating optical element | Physics | 9 | Active |
| US9671548B2 | Optical waveguide for guiding illumination light | Physics | 7 | Active |
| US8339577B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 6 | Active |
| US8705005B2 | Microlithographic illumination system | Physics | 6 | Active |
| US8467031B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 5 | Active |
| US8854604B2 | Microlithographic projection exposure apparatus | Physics | 4 | Active |
| US8873023B2 | Illumination system for microlithography | Physics | 4 | Active |
| US9046786B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 4 | Active |
| US9116439B2 | Illumination system and lithographic apparatus | Physics | 3 | Active |
| US8724086B2 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Physics | 3 | Active |
| US9310694B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 3 | Active |
| US9280060B2 | Illumination system for microlithography | Physics | 3 | Active |
| US7551263B2 | Device for adjusting the illumination dose on a photosensitive layer | Physics | 3 | Active |
| US8004656B2 | Illumination system for a microlithographic projection exposure apparatus | Physics | 3 | Active |
| US9500954B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US9645501B2 | Illumination optical unit for EUV projection lithography, and optical system comprising such an illumination optical unit | Electricity | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.