Patent · US Active

Metal complexes for depositing films and method of making and using the same

US11008353B2 · kind B2 · utility

0Cited by
6References
33Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 13, 2018
Grant dateMay 18, 2021
Priority date
Expiry dateJul 13, 2038

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/45553
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

Provided herein are metal-ligand complexes, and associated methods, characterized by formula MLxDy; wherein: M is a metal; x is equal to the oxidation state of M; each D is independently a neutral coordinating ligand; y is zero or an integer selected from the range of 1 to 4; and each L is independently a mono-anionic ligand. L may be a η1,η2-β,β-disubstituted-ω-alkenyl ligand.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.