Semiconductor device and method of making a semiconductor device
US11011446B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 3, 2016 |
| Grant date | May 18, 2021 |
| Priority date | — |
| Expiry date | Dec 17, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/37
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A semiconductor device and a method of making the same. The device includes a semiconductor substrate having a major surface, a backside and side surfaces extending between the major surface and the backside. The semiconductor device also includes at least one metal layer extending across the backside of the substrate. A peripheral part of the at least one metal layer located at the edge of the substrate between the backside and at least one of the side surfaces extends towards a plane containing the major surface. This can prevent burrs located at the peripheral part of the at least one metal layer interfering with the mounting of the backside of the substrate on the surface of a carrier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.