Spin coating apparatus, system, and method
US11020766B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2019 |
| Grant date | Jun 1, 2021 |
| Priority date | — |
| Expiry date | Sep 19, 2039 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/042
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A spin coating apparatus, system, and/or method that increase the uniformity of a coating material on a substrate. The spin coating system may be specifically directed for use with polygonal shaped substrates. The spin coating system may include a process chamber within which the substrate is located, spinning on a chuck, during operation. The spin coating system may include gas injection ports that inject a gas into the process chamber so that the gas contacts the substrate along corner portions of its front surface. This injection of the gas increases pressure and prevents excessive build-up of the coating material that may otherwise occur when spin coating polygonal shaped substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.