Patent · US Active

Method and device for measuring the depth of the vapor capillary during a machining process with a high-energy beam

US11027364B2 · kind B2 · utility

0Cited by
3References
20Claims
0Family size

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Key dates

Filing dateOct 19, 2016
Grant dateJun 8, 2021
Priority date
Expiry dateSep 4, 2037

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B2290/65
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A method for measuring the depth of the vapour cavity during an industrial machining process employs a high-energy beam. An optical measuring beam is directed towards the base of a vapour cavity. An optical coherence tomograph generates interference factors or other raw measurement data from reflections of the measurement beam. An evaluation device generates undisturbed measurement data, wherein raw measurement data that is generated at different times is processed together in the course of a mathematical operation. This operation can be a subtraction or a division. Slowly changing interference factors can thus be eliminated. An end value for the distance to the base of the vapour cavity is calculated from the undisturbed measurement data using a filter. As a result, the depth of the vapour cavity can be determined, in the knowledge of the distance at a part of the surface of the work piece that is not exposed to the high-energy beam.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.