PRECITEC OPTRONIK GMBH
🏢 View company profile →25Patents
25Active
25Granted
51Portfolio score
Filing activity: Mar 4, 2008 → May 23, 2024 · 2 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8982339B2 | Material-working device with in-situ measurement of the working distance | Physics | 29 | Active |
| US8410392B2 | Machining device and method for machining material | Physics | 20 | Active |
| US9494409B2 | Test device for testing a bonding layer between wafer-shaped samples and test process for testing the bonding layer | Physics | 11 | Active |
| US8716039B2 | Monitoring apparatus and method for in-situ measurement of wafer thicknesses for monitoring the thinning of semiconductor wafers and thinning apparatus comprising a wet etching apparatus and a monitoring apparatus | Electricity | 9 | Active |
| US9297645B2 | Apparatus and method for determining a depth of a region having a high aspect ratio that protrudes into a surface of a semiconductor wafer | Physics | 9 | Active |
| US10228551B1 | Device and method for optically measuring a measurement object | Physics | 8 | Active |
| US9500471B2 | Optical measuring device and method for acquiring in situ a stage height between a support and an edge region of an object | Physics | 8 | Active |
| US9677871B2 | Optical measuring method and measuring device having a measuring head for capturing a surface topography by calibrating the orientation of the measuring head | Physics | 7 | Active |
| US10234265B2 | Distance measuring device and method for measuring distances | Physics | 4 | Active |
| US9982994B2 | Optical measuring method and measuring device having a measuring head for capturing a surface topography by calibrating the orientation of the measuring head | Physics | 3 | Active |
| US8699038B2 | Apparatus and method for monitoring a thickness of a silicon wafer with a highly doped layer | Electricity | 2 | Active |
| US10449631B2 | Machining head for a laser machining device | Physics | 2 | Active |
| US10466357B1 | Optical measuring device | Physics | 1 | Active |
| US10260941B2 | Chromatic confocal distance sensor | Physics | 1 | Active |
| US9230817B2 | Apparatus and method for monitoring a thickness of a silicon wafer with a highly doped layer | Electricity | 0 | Active |
| US11460577B2 | Distance measuring device | Physics | 0 | Active |
| US11027364B2 | Method and device for measuring the depth of the vapor capillary during a machining process with a high-energy beam | Physics | 0 | Active |
| US10731965B1 | Phosphor light source for CLS or multipoint | Physics | 0 | Active |
| US10695863B1 | Method and device for the controlled machining of a workpiece | Physics | 0 | Active |
| US10725178B2 | Optical measuring device | Physics | 0 | Active |
| US9770783B2 | Method for measuring the distance between a workpiece and a machining head of a laser machining apparatus | Physics | 0 | Active |
| US12264914B2 | Device and method for measuring wafers | Physics | 0 | Active |
| US11219967B2 | Machining head for a laser machining device | Physics | 0 | Active |
| US10571249B1 | Optical measuring device and method | Physics | 0 | Active |
| US10762348B2 | Method and apparatus for determining the position and/or the orientation of an eye | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.