Patent · US Active

Optical element for the beam guidance of imaging light in projection lithography

US11029606B2 · kind B2 · utility

0Cited by

1References

22Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Jens Prochnau · Oberkochen, DE
Dirk Schaffer · Jena, DE
Roman Orlik · Northeim, DE

Key dates

Filing date	Jan 7, 2020
Grant date	Jun 8, 2021
Priority date	—
Expiry date	Jan 7, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70825
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical element is configured to guide imaging light in projection lithography. The optical element has a main body and at least one optical surface carried by the main body. At least one compensation weight element, which is attached to the main body, serves for a weight compensation of a figure deformation of the optical surface caused by gravity. This results in an optical element with a small figure deformation at the use location.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.