Debris removal in high aspect structures
US11040379B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 19, 2019 |
| Grant date | Jun 22, 2021 |
| Priority date | — |
| Expiry date | Sep 15, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01Q80/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.