Patent · US Active

Growth of plural sample rods to determine impurity build-up during production of single crystal silicon ingots

US11047066B2 · kind B2 · utility

0Cited by
8References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 27, 2018
Grant dateJun 29, 2021
Priority date
Expiry dateSep 17, 2038

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC30B15/32
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Methods for forming single crystal silicon ingots in which plural sample rods are grown from the melt are disclosed. A parameter related to the impurity concentration of the melt or ingot is measured. In some embodiments, the sample rods each have a diameter less than the diameter of the product ingot.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.