Patent · US Active

Boron-doped amorphous carbon hard mask and related methods

US11049728B2 · kind B2 · utility

2Cited by
8References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 18, 2019
Grant dateJun 29, 2021
Priority date—
Expiry dateOct 18, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/469
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Described are boron-doped amorphous carbon hard masks, methods of preparing boron-doped amorphous carbon hard masks, methods of using the boron-doped amorphous carbon hard masks, and devices that include the boron-doped amorphous carbon hard masks.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.