Nozzle for uniform plasma processing
US11053590B2 · kind B2 · utility
2Cited by
45References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 26, 2019 |
| Grant date | Jul 6, 2021 |
| Priority date | — |
| Expiry date | Dec 29, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A nozzle for uniform plasma processing comprises an inlet portion and an outlet portion. The inlet portion has a side surface substantially parallel to a vertical axis. The inlet portion comprises a plurality of gas channels. The outlet portion is coupled to the inlet portion. The outlet portion comprises a plurality of outlets. At least one of the outlets is at an angle other than a right angle relative to the vertical axis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.