Spatially self-similar patterned illumination for depth imaging
US11054506B2 · kind B2 · utility
2Cited by
42References
19Claims
0Family size
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Key dates
| Filing date | Apr 10, 2020 |
| Grant date | Jul 6, 2021 |
| Priority date | — |
| Expiry date | Apr 10, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/20056
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods, systems, and devices involving patterned radiation are provided in accordance with various embodiments. Some embodiments include a device for projecting pattern radiation. Some embodiments include a method for estimating coordinates of a location on an object in a 3D scene. Some embodiments include a system for estimating the coordinates of a location on an object in a 3D scene. A variety of radiation patterns are provided in accordance with various embodiments. Some embodiments may relate to the use of patterned illumination to identify the angular information that may be utilized to measure depth by triangulation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.