Method for fabricating superconducting devices using a focused ion beam
US11063201B2 · kind B2 · utility
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31Claims
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Key dates
| Filing date | Jan 23, 2019 |
| Grant date | Jul 13, 2021 |
| Priority date | — |
| Expiry date | May 17, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N69/00
Abstract
Nano-scale junctions, wires, and junction arrays are created by using a focused high-energy ion beam to direct-write insulating or poorly conducting barriers into thin films of materials that are sensitive to disorder, including superconductors, ferromagnetic materials and semiconductors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.