Patent · US Active

Method for fabricating superconducting devices using a focused ion beam

US11063201B2 · kind B2 · utility

0Cited by
13References
31Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 23, 2019
Grant dateJul 13, 2021
Priority date
Expiry dateMay 17, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N69/00

Abstract

Nano-scale junctions, wires, and junction arrays are created by using a focused high-energy ion beam to direct-write insulating or poorly conducting barriers into thin films of materials that are sensitive to disorder, including superconductors, ferromagnetic materials and semiconductors.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.