In situ vapor deposition polymerization to form polymers as precursors to viscoelastic fluids for particle removal from substrates
US11065654B2 · kind B2 · utility
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24Claims
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Key dates
| Filing date | Jun 25, 2018 |
| Grant date | Jul 20, 2021 |
| Priority date | — |
| Expiry date | Mar 1, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/26
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for cleaning a substrate includes supplying a vapor to a processing chamber to grow a polymer film on a substrate in the processing chamber; adding a solution to the polymer film on the substrate to create a viscoelastic fluid on the substrate; and removing the viscoelastic fluid to remove particle contaminants from the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.