Patent · US Active

Device manufacturing method

US11069536B2 · kind B2 · utility

0Cited by
1References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 11, 2019
Grant dateJul 20, 2021
Priority date
Expiry dateNov 11, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2221/68381
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

There is provided a method of manufacturing a device, which comprises: a preparation step of preparing a workpiece having a recess formed therein; a burying step of burying a sacrificial material composed of a thermally decomposable organic material in the recess; a lamination step of laminating a preliminary sealing film on the sacrificial material buried in the recess; a first removal step of removing the sacrificial material in the recess through the preliminary sealing film, by annealing the workpiece at a first temperature and thermally decomposing the sacrificial material; a processing step of performing a predetermined process on a portion other than the recess in the workpiece, in a state in which the recess is covered with the preliminary sealing film; and a second removal step of removing the preliminary sealing film.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.