Device for treating an object with plasma
US11075057B2 · kind B2 · utility
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3Claims
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Key dates
| Filing date | Jan 13, 2018 |
| Grant date | Jul 27, 2021 |
| Priority date | — |
| Expiry date | Jun 5, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for treating an object with plasma includes a vacuum processing chamber having a holder on which the object to be treated is placed, at least two subassemblies each including at least one plasma source able to generate a plasma and being supplied with radio-frequency power Pi and with a gas i of independent flow rate ni. The plasma generated by one of the subassemblies is a partially ionized gas or gas mixture of different chemical nature from the plasma generated by the other subassembly or subassemblies. A process for selectively treating a composite object employing such a device is described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.