Substrate processing apparatus
US11075095B2 · kind B2 · utility
5Cited by
1References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 8, 2019 |
| Grant date | Jul 27, 2021 |
| Priority date | — |
| Expiry date | Sep 23, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67248
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A supply flow passage branches into a plurality of upstream flow passages. The plurality of upstream flow passages include a branching upstream flow passage that branches into a plurality of downstream flow passages. A plurality of discharge ports are respectively disposed at a plurality of positions differing in distance from a rotational axis and discharge processing liquids, supplied via the plurality of upstream flow passages, toward an upper surface of a substrate held by a substrate holding unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.