Patent · US Active

Reliable deposition of thin parylene

US11077462B2 · kind B2 · utility

3Cited by
21References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 21, 2016
Grant dateAug 3, 2021
Priority date
Expiry dateOct 7, 2038

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/45559
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Apparatus, system, and method of depositing thin and ultra-thin parylene are described. In an example, a core deposition chamber is used. The core deposition chamber includes a base and a rigid, removable cover configured to mate and seal with the base to create the core deposition chamber and to define an inside and an outside of the core deposition chamber. The core deposition chamber also includes a conduit through a top of the cover. The conduit has a lumen connecting the inside to the outside of the core deposition chamber. The lumen has a length and a cross-section. The cross-section has a width between 50 μm and 6000 μm. The length is less than 140 times the cross-section width. The core deposition chamber can be placed in an outer deposition chamber and can achieve parylene deposition less than 1 μm thick inside the core deposition chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.