Measuring microscope for measuring masks for lithographic methods and measuring method and calibration method therefor

US11079586B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Oliver Jäckel · Jena, DE
• Carola Bläsing-Bangert · Kahla, DE
• Dirk Seidel · Jena, DE

Key dates

• Filing date: Mar 17, 2017
• Grant date: Aug 3, 2021
• Expiry date: Jul 7, 2039

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N2021/458
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

The present invention relates to a method for calibrating a measuring microscope which may be used to measure masks, in which a calibration mask is utilized in a self-calibration algorithm in order to ascertain error correction data of the measuring microscope, wherein, in the self-calibration algorithm, the calibration mask is imaged and measured in various positions in the measuring microscope in order to ascertain one or more portions of the error correction data, wherein the surface profile of the calibration mask is ascertained and utilized when determining the error correction. Moreover, the invention relates to a measuring microscope and a method for operating same.