Patent · US Active

Method and apparatus for repairing defects of a photolithographic mask for the EUV range

US11079673B2 · kind B2 · utility

0Cited by

2References

30Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Hendrik Steigerwald · Urmitz, DE
Renzo Capelli · Heidenheim, DE

Key dates

Filing date	Mar 30, 2018
Grant date	Aug 3, 2021
Priority date	—
Expiry date	Jan 26, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG06F30/39
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to a method and an apparatus for repairing at least one defect of a photolithographic mask for the extreme ultraviolet (EUV) wavelength range, wherein the method includes the steps of: (a) determining the at least one defect; and (b) ascertaining a repair shape for the at least one defect; (c) wherein the repair shape is diffraction-based in order to take account of a phase disturbance by the at least one defect.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.