Renzo Capelli
12Patents
1h-index
12Co-inventors
43Inventor score
Filing activity: Nov 25, 2015 → Nov 22, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10055833B2 | Method and system for EUV mask blank buried defect analysis | Physics | 1 | Active |
| US12422743B2 | Method for measuring a reflectivity of an object for measurement light and metrology system for carrying out the method | Physics | 0 | Active |
| US11774848B2 | Method and apparatus for repairing defects of a photolithographic mask for the EUV range | Physics | 0 | Active |
| US10564551B2 | Method for determining a focus position of a lithography mask and metrology system for carrying out such a method | Physics | 0 | Active |
| US11061331B2 | Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth | Physics | 0 | Active |
| US10775691B2 | Method for examining photolithographic masks and mask metrology apparatus for performing the method | Physics | 0 | Active |
| US10481505B2 | Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks | Physics | 0 | Active |
| US11796926B2 | Metrology system for examining objects with EUV measurement light | Physics | 0 | Active |
| US12288272B2 | Method for determining a production aerial image of an object to be measured | Physics | 0 | Active |
| US12174546B2 | Method for measuring an effect of a wavelength-dependent measuring light reflectivity and an effect of a polarization of measuring light on a measuring light impingement on a lithography mask | Physics | 0 | Active |
| US11079673B2 | Method and apparatus for repairing defects of a photolithographic mask for the EUV range | Physics | 0 | Active |
| US12372431B2 | Method for determining an imaging quality of an optical system when illuminated by illumination light within a pupil to be measured | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.