Wafer arrangement for gas sensor

US11092538B2 · kind B2 · utility

Assignees

• Infineon Technologies AG · DE
• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Stefan Kolb · Unterschleißheim, DE
• Alfons Dehe · Reutlingen, DE
• Jochen Huber · Wolfach, DE
• Franz Jost · Stuttgart, DE
• Horst Theuss · Wenzenbach, DE
• Wilhelm Wiedmeier · Augsburg, DE
• Juergen Woellenstein · Glückstadt, DE

Key dates

• Filing date: Jul 31, 2020
• Grant date: Aug 17, 2021
• Expiry date: Jul 31, 2040

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N2291/0256
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A gas sensor includes a multi-wafer stack of a plurality of layers and a measurement chamber. The plurality of layers includes a first layer comprising a sensor element that has a microelectromechanical system (MEMS) membrane; and a second layer comprising an emitter element configured to emit electromagnetic radiation. The measurement chamber is interposed between the first layer and the second layer. The measurement chamber is configured to receive a measurement gas and further receive the electromagnetic radiation emitted by the emitter element as the electromagnetic radiation travels along a radiation path from a first end of the measurement chamber to a second end of the measurement chamber that is opposite to the first end.