Inspection sensitivity improvements for optical and electron beam inspection
US11092893B2 · kind B2 · utility
0Cited by
3References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 22, 2019 |
| Grant date | Aug 17, 2021 |
| Priority date | — |
| Expiry date | Aug 20, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7065
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An inspection-sensitive additive can improve inspection of photoresist on semiconductor wafers. The inspection-sensitive additive can be used to stain the photoresist or can be deposited as a layer on the photoresist. The inspection-sensitive additive can have a k-value that is greater than 20% larger than a photoresist k-value of the photoresist layer for an inspection wavelength between 120 nm and 950 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.