Andrew Cross
10Patents
2h-index
14Co-inventors
43Inventor score
Filing activity: Oct 11, 2016 → Apr 26, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10818001B2 | Using stochastic failure metrics in semiconductor manufacturing | Electricity | 6 | Active |
| US10699926B2 | Identifying nuisances and defects of interest in defects detected on a wafer | Physics | 4 | Active |
| US10262408B2 | System, method and computer program product for systematic and stochastic characterization of pattern defects identified from a semiconductor wafer | Physics | 2 | Active |
| US10262831B2 | Method and system for weak pattern quantification | Electricity | 1 | Active |
| US10957608B2 | Guided scanning electron microscopy metrology based on wafer topography | Electricity | 0 | Active |
| US10068323B2 | Aware system, method and computer program product for detecting overlay-related defects in multi-patterned fabricated devices | Electricity | 0 | Active |
| US12066763B2 | Sensitivity improvement of optical and SEM defection inspection | Electricity | 0 | Active |
| US12235224B2 | Process window qualification modulation layouts | Physics | 0 | Active |
| US11092893B2 | Inspection sensitivity improvements for optical and electron beam inspection | Physics | 0 | Active |
| US10598617B2 | Metrology guided inspection sample shaping of optical inspection results | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.