Fluid control system
US11094563B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 19, 2018 |
| Grant date | Aug 17, 2021 |
| Priority date | — |
| Expiry date | Feb 19, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67739
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.