Processing apparatus, abnormality detection method, and storage medium
US11094568B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2018 |
| Grant date | Aug 17, 2021 |
| Priority date | — |
| Expiry date | Mar 23, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67173
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A processing apparatus includes a chamber configured to accommodate a substrate to be processed, a nozzle provided in the chamber and configured to supply a processing solution to the substrate, a flow rate measuring part configured to measure a flow rate of the processing solution supplied to the nozzle, a flow path opening/closing part configured to open and close a supply flow path of the processing solution to the nozzle, and a controller configured to output a close signal causing the flow path opening/closing part to perform a closing operation that closes the supply flow path. The controller is configured to detect an operation abnormality of the flow path opening/closing part based on an accumulated amount of the flow rate measured by the flow rate measuring part after outputting the close signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.