Test of operational status of a digital scanner during lithographic exposure process
US11099007B2 · kind B2 · utility
2Cited by
0References
27Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 6, 2019 |
| Grant date | Aug 24, 2021 |
| Priority date | — |
| Expiry date | Nov 6, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2009/0261
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
System and method for monitoring of performance of a mirror array of a digital scanner with a use of light, illuminating the mirror array at grazing (off-axis) incidence, and an optical imaging system that includes a lateral shearing interferometer (operated in either static or a phase-shifting condition) during and without interrupting the process of exposure of the workpiece with the digital scanner, to either simply identify problematic pixels for further troubleshooting or measure the exact magnitude of the deformation of a mirror element of the mirror array.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.