Exposure system and lithography system
US11106145B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 12, 2017 |
| Grant date | Aug 31, 2021 |
| Priority date | — |
| Expiry date | Dec 15, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/027
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure system is equipped with: chambers in a first row that are disposed on the +X side with respect to a C/D installed on a floor surface; chambers in a second row that are disposed on the +Y side of the chambers in the first row, facing the chambers in the first row; and a measurement chamber and a control rack that are disposed adjacently on the −X side with respect to the chambers in the first row and the second row and besides on the +X side of the C/D. Inside at least some of the chambers, an exposure room where exposure is performed is formed, and the control rack distributes utility supplied from below the floor surface to each of the chambers in the first row and the second row.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.