Cleaning liquid, and method of cleaning substrate provided with metal resist
US11119410B2 · kind B2 · utility
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9Claims
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Key dates
| Filing date | Apr 1, 2020 |
| Grant date | Sep 14, 2021 |
| Priority date | — |
| Expiry date | Apr 1, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/16
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A metal resist cleaning liquid including a solvent, an organic acid, and a compound (B) represented by general formula (b-1) shown below (In the formula, Rb1 and Rb2 each independently represents an alkyl group having 1 to 3 carbon atoms; Rb3 and Rb4 each independently represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; Yb1 represents a single bond, —O—, —S— or —N(Rb5)—; Rb5 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; Yb2 represents —O—, —S— or —N(Rb6)—; Rb6 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; and n represents an integer of 0 to 3).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.